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Ultra-thin Film Evaluation System HD-2300
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Hitachi would like to introduce you to a new 2nd generation ultra-thin film evaluation system, with improved functions and performance to enhance high-end imaging and analysis. Hitachi's reply to advanced high throughput tool requirements. |
Features
- Quick observation
Specimen exchange: within 2 minutes
High voltage application: 3 minutes (Standby condition to 200 kV on)
- Automated column alignment
Automation includes SE alignment, Stigmator alignment, and Bright area centering.
- Automated image viewing functions
Automation includes auto-focus, auto-stigmation, auto-brightness and contrast.
- High resolution STEM and SEM images
Guaranteed 0.204 nm resolution phase-contrast imaging.
- Nano-area electron diffraction: Simultaneous display with STEM image
Electron diffraction pattern images acquired from a 2 to 3 nm area
while simultaneously viewing the Z-contrast image, aiding specific specimen orientation.
- High sensitivity EDX analysis
X-ray take-off angle: 20° or greater
X-ray solid angle: 0.3 sr or greater
- High speed and high sensitivity Hitachi EELS imaging system
The ELV-2000 Elements View permits real-time elemental mapping (about 40 seconds,
or 80 seconds/one element/one picture) of light elements(C/N/O, etc.)
and transition elements (Cr/Fe/Co, etc.)
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System Feature
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Description |
Crystal lattice resolution |
0.204nm guaranteed (Magnification: x4,000,000) |
Accelerating voltage |
200V |
Magnification range |
100x to 10,000,000x (for observation)
100x to 5,000,000x (for recording) |
Electron optics |
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Shottky emitter (Anode heater built in)
Option: Cold field electron source (Anode heater built-in) |
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2-stage condenser, objective and projector lenses |
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4-opening click-stop aperture |
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2-stage electro-magnetic coil |
Imaging mode |
Phase contrast image (BF image),
Z-contrast image (HAADF image),
Secondary electron image (SE image),
Electron diffraction pattern (Live diffraction unit)*
Characteristic X-ray image
(using Energy Dispersive X-ray System)*
EELS image (using ELV-2000 Elements View system)* |
Image shift |
Electrical image shift: ±1 micron |
Specimen stage |
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Side-entry system |
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X = ± mm, Y = ± mm, T = ±30°, Z= ±0.3 mm |
| Specimen position display |
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Specimen position trace function built in |
Vacuum system
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Ion pumps: 2 units
Turbomolecular Pump: 1 unit
Dry pump ESDP* : 1 unit
Electron source: 1 x 10-7 Pa or better
Specimen chamber: 5 x10-5 Pa or better |
Display system |
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PC/AT compatible, Windows®** |
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Type 19 flat panel display |
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640 x 480, 1,280 x 960, 2,560x1,920 pixels |
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Image processing software, Image filing software |
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BMP, TIFF, JPEG |
Adjustment functions |
| Axial alignment functions |
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SE alignment (current center alignment for SE mode)
Stigmator alignment (for minimum image shift during stigmation)
Bright area centering (centering of TEM field of view) |
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Auto focus
Auto-stigmation
Auto-brightness and contrast (ABCC) |
EDX analysis* |
X-ray take-off angle: 20° or higher,
X-ray solid angle: 0.3 sr or greater |
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Utilities
Item |
Description |
Room temperature |
15 to 23° (temperature variation: 2° /hour or smaller) |
Humidity |
40 to 60% RH |
Power |
Single phase AC100 V±10%, 50/60 Hz, 7.5 kVA
Single phase AC 100 V±10%, 50/60 Hz, 1.5 kVA |
Grounding |
Grounding resistance of 100 ohms or less |
Cooling water |
Water temperature: 16 to 18°C
(Temperature variation: 0.1°C/min max.or smaller)
Flow: 2.0 to 2.5 L/min, Pressure: 50 to 100 kPa |
Compressed air |
Pressure: 350 to 500 kPa, controllable |
Dry nitrogen |
Pressure: 0 to 100 kPa, controllable, Purity: 99.99% or better |
SF6 gas |
Pressure: 0 to 500 kPa, controllable, Purity: 99.9% or better |
External vibration |
less than 1 Hz: 1.0 microns peak to peak or less
1 to 3 Hz: 0.5 microns peak to peak or less
3 Hz or larger: 1.0 microns peak to peak or less |
Stray magnetic field |
AC field: 100 nT (effective value) or less
DC field: 100 nT (peak to peak) or less |
Acoustic noise |
70 dB (characteristic C, overall value) or less |
*: |
Available as an option |
**: |
Windows® is a registered trademark of Microsoft Corp., U. S. A. |
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